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The effect of applied electric field on pulsed radio frequency and pulsed direct current plasma jet array
journal contribution
posted on 2014-11-28, 15:36 authored by J.T. Hu, X.Y. Liu, J.H. Liu, Z.L. Xiong, D.W. Liu, X.P. Lu, Felipe IzaFelipe Iza, Michael G. KongHere we compare the plasma plume propagation characteristics of a 3-channel pulsed RF plasma jet array and those of the same device operated by a pulsed dc source. For the pulsed-RF jet array, numerous long life time ions and metastables accumulated in the plasma channel make the plasma plume respond quickly to applied electric field. Its structure similar as “plasma bullet” is an anode glow indeed. For the pulsed dcplasma jet array, the strong electric field in the vicinity of the tube is the reason for the growing plasma bullet in the launching period. The repulsive forces between the growing plasma bullets result in the divergence of the pulsed dcplasma jet array. Finally, the comparison of 309 nm and 777 nm emissions between these two jet arrays suggests the high chemical activity of pulsed RF plasma jet array.
Funding
This work was supported by the National Natural Science Foundation of China under Grant No. 51007029, Foundation from HUST under Grant No. 2012QN197 and the SRF for ROCS, SEM.
History
School
- Mechanical, Electrical and Manufacturing Engineering
Published in
PHYSICS OF PLASMASVolume
19Issue
6Pages
? - ? (5)Citation
HU, J.T. ... et al, 2012. The effect of applied electric field on pulsed radio frequency and pulsed direct current plasma jet array. Physics of Plasmas, 19 (6), 063505.Publisher
© American Institute of PhysicsVersion
- VoR (Version of Record)
Publication date
2012Notes
© 2012 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Physics of Plasmas, 19 (6), 063505 and may be found at http://dx.doi.org/10.1063/1.4729730ISSN
1070-664XPublisher version
Language
- en