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The extended growth of graphene oxide flakes using ethanol CVD
journal contribution
posted on 2013-08-14, 09:04 authored by Jingfeng Huang, Melanie Larisika, Derrick W.H. Fam, Qiyuan He, Myra A. Nimmo, Christoph Nowak, Alfred I.Y. TokWe report the extended growth of Graphene Oxide (GO) flakes using atmospheric pressure ethanol Chemical Vapor Deposition (CVD).
GO was used to catalyze the deposition of carbon on substrate in the ethanol CVD with Ar and H2 as carrier gases. Raman, SEM, XPS
10 and AFM characterized the growth to be reduced GO (RGO) of <5 layers. This new grown RGO possesses lower defect density with
larger and increased distribution of sp2 domains than chemically-reduced RGO. Furthermore this method without optimization reduces
relative standard deviation of electrical conductivity between chips, from 80.5% to 16.5%, enabling RGO to be used in practical
electronic devices.
Funding
The authors are grateful for the funding from the Institute for Sports Research (ISR) of Nanyang Technological University (NTU) and the International Graduate School Bio-Nano-Tech; 5 a joint program of University of Natural Resources and Life Sciences Vienna (BOKU), the Austrian Institute of Technology (AIT) and NTU.
History
School
- Sport, Exercise and Health Sciences
Citation
HUANG, J. ... et al, 2013. The extended growth of graphene oxide flakes using ethanol CVD. Nanoscale, 5 (7), pp.2945-2951.Publisher
RSC Publishing (journal © The Royal Society of Chemistry; article © the authors)Version
- SMUR (Submitted Manuscript Under Review)
Publication date
2013Notes
This article is closed access until 3rd February 2014.ISSN
2040-3364eISSN
2040-3372Publisher version
Language
- en