Thesis-1997-Safi.pdf (11.57 MB)
A study of reactive magnetron sputtering of alloy transparent conducting oxides from elemental targets
thesis
posted on 2014-02-10, 14:26 authored by Iyad SafiMethods of reactive magnetron sputtering using the sequential oxidisation of a
sputtered metal film from two magnetron sources, in a rotating substrate system, have
been developed. A rotation rate of around one revolution per second enhanced atomic
level mixing of the film constituents on the substrate. Depending on the materials
involved, two very fast feedback methods were employed to automatically control the
admission rate of oxygen into the sputtering system. These methods were plasma
emission monitoring (PEM), which was used to control the reactive sputter-deposition
of In, Zn, W, V, Mo and Ti oxide, and voltage control, which was used to control the
reactive sputter-deposition of Zn, Cu, Pb and Al oxide. The stoichiometry of the film
was controlled by PEM or voltage control on one magnetron, and dopants were added
by sputtering from the other magnetron. In other words, the former magnetron served
two purposes; the first was to sputter metal and oxidise it, and the second purpose was
to oxidise the metal sputtered from the other magnetron... cont'd
History
School
- Science
Department
- Physics
Publisher
© Iyad SafiPublication date
1997Notes
A Doctoral Thesis. Submitted in partial fulfilment of the requirements for the award of Doctor of Philosophy of Loughborough University.EThOS Persistent ID
uk.bl.ethos.362676Language
- en