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Aerosol-assisted CVD of bismuth vanadate thin films and their photoelectrochemical properties

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posted on 2015-02-27, 09:13 authored by Paul Brack, Jagdeep Sagu, Nirmal Peiris, Andrew McInnes, Mauro Senili, Upul Wijayantha-Kahagala-Gamage, Frank Marken, Elena Selli
Thin film bismuth vanadate (BiVO4) photoelectrodes are prepared by aerosol-assisted (AA)CVD for the first time on fluorine-doped tin oxide (FTO) glass substrates. The BiVO4 photoelectrodes are characterised by X-ray diffraction (XRD), Raman spectroscopy (RS), and energy-dispersive X-ray (EDX) spectroscopy and are found to consist of phase-pure monoclinic BiVO4. Scanning electron microscopy (SEM) analysis shows that the thin film is uniform with a porous structure, and consists of particles approximately 75-125nm in diameter. The photoelectrochemical (PEC) properties of the BiVO4 photoelectrodes are studied in aqueous 1M Na2SO4 and show photocurrent densities of 0.4mAcm-2, and a maximum incident-photon-to-electron conversion efficiency (IPCE) of 19% at 1.23V vs. the reversible hydrogen electrode (RHE). BiVO4 photoelectrodes prepared by this method are thus highly promising for use in PEC water-splitting cells. Thin film bismuth vanadate (BiVO4) photoelectrodes are prepared by AACVD for the first time on fluorine-doped tin oxide (FTO) glass substrates. The photoelectrochemical (PEC) properties of the BiVO4 photoelectrodes are studied in aqueous 1M Na2SO4 and show photocurrent densities of 0.4mAcm-2 and a maximum incident-photon-to-electron conversion efficiency (IPCE) of 19% at 1.23V vs. RHE. BiVO4 photoelectrodes prepared by this method are highly promising for use in PEC water-splitting cells.

Funding

UK ESPRC through the Doctoral Training Centre for Hydrogen, Fuel cells and their applications [grant number: EP/G031088/1]

History

School

  • Science

Department

  • Chemistry

Published in

Chemical Vapor Deposition

Citation

BRACK, P. ... et al., 2015. Aerosol-assisted CVD of bismuth vanadate thin films and their photoelectrochemical properties. Chemical Vapor Deposition, 21(1-2-3), pp. 41-45.

Publisher

© The Authors. Published by Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim

Version

  • VoR (Version of Record)

Publisher statement

This work is made available according to the conditions of the Creative Commons Attribution 4.0 International (CC BY 4.0) licence. Full details of this licence are available at: http://creativecommons.org/licenses/ by/4.0/

Publication date

2015

Notes

This is an open-access article distributed under the terms of the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original author and source are credited. Full details of the CC BY licence are available at: http://creativecommons.org/licenses/by/4.0/

ISSN

0948-1907

eISSN

1521-3862

Language

  • en

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