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|Title: ||The extended growth of graphene oxide flakes using ethanol CVD|
|Authors: ||Huang, Jingfeng|
Fam, Derrick W.H.
Nimmo, Myra A.
Tok, Alfred I.Y.
|Issue Date: ||2013|
|Publisher: ||RSC Publishing (journal © The Royal Society of Chemistry; article © the authors)|
|Citation: ||HUANG, J. ... et al, 2013. The extended growth of graphene oxide flakes using ethanol CVD. Nanoscale, 5 (7), pp.2945-2951.|
|Abstract: ||We report the extended growth of Graphene Oxide (GO) flakes using atmospheric pressure ethanol Chemical Vapor Deposition (CVD).
GO was used to catalyze the deposition of carbon on substrate in the ethanol CVD with Ar and H2 as carrier gases. Raman, SEM, XPS
10 and AFM characterized the growth to be reduced GO (RGO) of <5 layers. This new grown RGO possesses lower defect density with
larger and increased distribution of sp2 domains than chemically-reduced RGO. Furthermore this method without optimization reduces
relative standard deviation of electrical conductivity between chips, from 80.5% to 16.5%, enabling RGO to be used in practical
|Description: ||This article is closed access until 3rd February 2014.|
|Sponsor: ||The authors are grateful for the funding from the Institute for Sports
Research (ISR) of Nanyang Technological University (NTU) and the
International Graduate School Bio-Nano-Tech; 5 a joint program of
University of Natural Resources and Life Sciences Vienna (BOKU), the
Austrian Institute of Technology (AIT) and NTU.|
|Version: ||Submitted for publication|
|Publisher Link: ||http://dx.doi.org/10.1039/c3nr33704a|
|Appears in Collections:||Published Articles (Sport, Exercise and Health Sciences)|
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