FRASTIA, L. ARCHER, A.J. and THIELE, U., 2011. Dynamical model for the formation of patterned deposits at receding contact lines. Physical Review Letters, 106, 077801, 4pp.
We describe the formation of deposition patterns that are observed in many different experiments where a three-phase contact line of a volatile nanoparticle suspension or polymer solution recedes. A dynamical
model based on a long-wave approximation predicts the deposition of irregular and regular line patterns
due to self-organized pinning-depinning cycles corresponding to a stick-slip motion of the contact line.
We analyze how the line pattern properties depend on the evaporation rate and solute concentration.
We acknowledge support by the EU via the ITN