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Title: Dynamical model for the formation of patterned deposits at receding contact lines
Authors: Frastia, Lubor
Archer, Andrew J.
Thiele, Uwe
Issue Date: 2011
Publisher: © American Physical Society
Citation: FRASTIA, L. ARCHER, A.J. and THIELE, U., 2011. Dynamical model for the formation of patterned deposits at receding contact lines. Physical Review Letters, 106, 077801, 4pp.
Abstract: We describe the formation of deposition patterns that are observed in many different experiments where a three-phase contact line of a volatile nanoparticle suspension or polymer solution recedes. A dynamical model based on a long-wave approximation predicts the deposition of irregular and regular line patterns due to self-organized pinning-depinning cycles corresponding to a stick-slip motion of the contact line. We analyze how the line pattern properties depend on the evaporation rate and solute concentration.
Sponsor: We acknowledge support by the EU via the ITN MULTIFLOW (PITN-GA-2008-214919).
Version: Published
DOI: 10.1103/PhysRevLett.106.077801
URI: https://dspace.lboro.ac.uk/2134/15356
Publisher Link: http://dx.doi.org/10.1103/PhysRevLett.106.077801
ISSN: 0031-9007
Appears in Collections:Published Articles (Maths)

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