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Title: The effect of applied electric field on pulsed radio frequency and pulsed direct current plasma jet array
Authors: Hu, J.T.
Liu, X.Y.
Liu, J.H.
Xiong, Z.L.
Liu, D.W.
Lu, X.P.
Iza, Felipe
Kong, Michael G.
Issue Date: 2012
Publisher: © American Institute of Physics
Citation: HU, J.T. ... et al, 2012. The effect of applied electric field on pulsed radio frequency and pulsed direct current plasma jet array. Physics of Plasmas, 19 (6), 063505.
Abstract: Here we compare the plasma plume propagation characteristics of a 3-channel pulsed RF plasma jet array and those of the same device operated by a pulsed dc source. For the pulsed-RF jet array, numerous long life time ions and metastables accumulated in the plasma channel make the plasma plume respond quickly to applied electric field. Its structure similar as “plasma bullet” is an anode glow indeed. For the pulsed dcplasma jet array, the strong electric field in the vicinity of the tube is the reason for the growing plasma bullet in the launching period. The repulsive forces between the growing plasma bullets result in the divergence of the pulsed dcplasma jet array. Finally, the comparison of 309 nm and 777 nm emissions between these two jet arrays suggests the high chemical activity of pulsed RF plasma jet array.
Description: © 2012 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Physics of Plasmas, 19 (6), 063505 and may be found at http://dx.doi.org/10.1063/1.4729730
Sponsor: This work was supported by the National Natural Science Foundation of China under Grant No. 51007029, Foundation from HUST under Grant No. 2012QN197 and the SRF for ROCS, SEM.
Version: Published
DOI: 10.1063/1.4729730
URI: https://dspace.lboro.ac.uk/2134/16398
Publisher Link: http://dx.doi.org/10.1063/1.4729730
ISSN: 1070-664X
Appears in Collections:Published Articles (Mechanical, Electrical and Manufacturing Engineering)

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