+44 (0)1509 263171
Please use this identifier to cite or link to this item:
|Title: ||Gallic acid photochemical oxidation as a model compound of winery wastewaters|
|Authors: ||Lucas, Marco S.|
Dias, Albino A.
Bezerra, Rui M.F.
Peres, Jose A.
|Keywords: ||Winery wastewater|
Advanced oxidation processes
|Issue Date: ||2008|
|Publisher: ||© Taylor & Francis Group, LLC|
|Citation: ||LUCAS, M. ... et al, 2008. Gallic acid photochemical oxidation as a model compound of winery wastewaters. Journal of Environmental Science and Health, Part A: Toxic/Hazardous Substances and Environmental Engineering, 43 (11), pp.1288-1295|
|Abstract: ||Winery wastewaters (WW) are characterized by their high organic load and by the presence of non-biodegradable compounds such as
phenolic compounds. This study was undertaken to evaluate the capacity of different Advanced Oxidation Processes (AOP) combined
with several radiation sources to degrade the phenolic compound Gallic Acid (GA). A toxicological assessment was also carried out
to evaluate the subproduct’s harmful effect generated during the most efficient AOP in the GA photoxidation. Through the course of
the study it was verified that the UV radiation lamp TNN 15/32 showed the capacity to degrade 34.7% of GA, the UV radiation lamp
TQ 150 achieved a value of 20.2% and the solar radiation presented only a value of 2.3% in 60 minutes. The combination of different
advanced oxidation processes (Fenton’s reagent, ferrioxalate and heterogeneous photocatalysis) were evaluated with the previously
studied sources of radiation. From the experiments conducted it was possible to suggest that the AOP in combination with Fe2+ +
H2O2 + UV TNN 15/32 (photo-Fenton process) was the most efficient process thereby achieving the GA degradation value of 95.6%
in 7.5 minutes and resulting in a total elimination of toxicity.
Keywords: Winery wastewater, gallic acid, advanced oxidation processes, toxicity assessment.|
|Description: ||This paper is closed access.|
|Version: ||Closed access|
|Publisher Link: ||http://dx.doi.org/10.1080/10934520802177904|
|Appears in Collections:||Closed Access (Chemical Engineering)|
Files associated with this item:
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.