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Effect of varying process parameters on CdTe thin film device performance and its relationship to film microstructure.pdf (789.77 kB)

Effect of varying process parameters on CdTe thin film device performance and its relationship to film microstructure

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conference contribution
posted on 2016-03-17, 14:07 authored by Amit Munshi, Ali AbbasAli Abbas, John Raguse, Kurt L. Barth, Walajabad S. Sampath, Michael WallsMichael Walls
The performance of CdTe thin film photovoltaic devices are sensitive to process parameters. In this study, efforts are made to further understand the effects of process parameters like process temperature and variation in cadmium chloride passivation treatment on CdTe films deposited using a sublimation based deposition system. The effects on film microstructure are studied using advanced microstructural characterization methods like TEM, SEM, EDS and SIMS while electrical performance is studied using various electrical measurements such as current density vs. voltage and electroluminescence. The aim of this study is to provide new insight into the understanding of relationship between fabrication process, device performance and thin film microstructure.

Funding

The research is carried out at Colorado State University is supported by NSF I/UCRC for Next Generation Photovoltaics.

History

School

  • Mechanical, Electrical and Manufacturing Engineering

Published in

40th IEEE Photovoltaic Specialists Conference (PVSC) 2014 IEEE 40TH PHOTOVOLTAIC SPECIALIST CONFERENCE (PVSC)

Pages

1643 - 1648 (6)

Citation

MUNSHI, A. ...et al., 2014. Effect of varying process parameters on CdTe thin film device performance and its relationship to film microstructure. Presented at the 40th IEEE Photovoltaic Specialists Conference (PVSC), Denver, CO, 2014, pp. 1643-1648.

Publisher

© IEEE

Version

  • AM (Accepted Manuscript)

Publisher statement

This work is made available according to the conditions of the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International (CC BY-NC-ND 4.0) licence. Full details of this licence are available at: https://creativecommons.org/licenses/by-nc-nd/4.0/

Publication date

2014

Notes

Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.

Language

  • en

Location

Denver, CO