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Please use this identifier to cite or link to this item: https://dspace.lboro.ac.uk/2134/22274

Title: Hysteresis of the contact angle of a meniscus inside a capillary with smooth, homogeneous solid walls
Authors: Kuchin, I.
Starov, Victor
Issue Date: 2016
Publisher: © American Chemical Society
Citation: KUCHIN, I. and STAROV, V., 2016. Hysteresis of the contact angle of a meniscus inside a capillary with smooth, homogeneous solid walls. Langmuir: the ACS journal of surfaces and colloids, 32(21), pp. 5333-5340.
Abstract: A theory of contact angle hysteresis of a meniscus inside thin capillaries with smooth, homogeneous solid walls is developed in terms of surface forces (disjoining/ conjoining pressure isotherm) using a quasi-equilibrium approach. The disjoining /conjoining pressure isotherm includes electrostatic, intermolecular, and structural components. The values of the static receding θr, advancing θa , and equilibrium θe contact angles in thin capillaries were calculated on the basis of the shape of the disjoining/conjoining pressure isotherm. It was shown that both advancing and receding contact angles depend on the capillary radius. The suggested mechanism of the contact angle hysteresis has a direct experimental confirmation: the process of receding is accompanied by the formation of thick β-films on the capillary walls. The effect of the transition from partial to complete wetting in thin capillaries is predicted and analyzed. This effect takes place in very thin capillaries, when the receding contact angle decreases to zero.
Description: This paper is in closed access until 10th May 2017
Sponsor: This research was supported by the Engineering and Physical Sciences Research Council, U.K.; the CoWet Marie Curie ITN project, EU; the COST MP1106 project and MAP EVAPORATION project, European Space Agency; and COST MP 1106, EU.
Version: Accepted
DOI: 10.1021/acs.langmuir.6b00721
URI: https://dspace.lboro.ac.uk/2134/22274
Publisher Link: http://dx.doi.org/10.1021/acs.langmuir.6b00721
ISSN: 1520-5827
Appears in Collections:Closed Access (Chemical Engineering)

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