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Please use this identifier to cite or link to this item: https://dspace.lboro.ac.uk/2134/22420

Title: Modification of montmorillonite with aminopropylisooctyl polyhedral oligomeric silsequioxane
Authors: Zhao, Feng
Wan, Chaoying
Bao, Xujin
Kandasubramanian, Balasubramanian
Keywords: Montmorillonite
Dual surfactant
Interlayer spacing
Thermal stability
Issue Date: 2009
Publisher: © Elsevier
Citation: ZHAO, F. ... et al., 2009. Modification of montmorillonite with aminopropylisooctyl polyhedral oligomeric silsequioxane. Journal of Colloid and Interface Science, 333 (1), pp.164-170.
Abstract: Sodium montmorillonite (Na-MMT) was modified with various amounts of aminopropylisooctyl polyhedral oligomeric silsequioxane (POSS) and a second surfactant (alkyl ammonium based) via ionexchange reactions. Interlayer spacing, interlamellar structure, and thermal and surface properties of these organoclays were characterized by wide angle X-ray diffraction, thermogravimetric analysis, and contact angle measurement. The interlayer space of POSS-modified clay (POSS-MMT) was strongly dependent on the arrangement of POSS surfactant but less dependent on the POSS concentration. The sodium ions in Na-MMT were only partially exchanged by protonized POSS due to the steric hindrance effect. In addition, the dual-surfactant-modified clays exhibited increased exchange ratios by controlling the amount of the second surfactant, resulting in a good balance in hydrophobicity and polarity of the modified clays. The resultant organoclays were mixed with polypropylene (PP) via a meltcompounding method. It was found that the dual-surfactant-modified clays with low polarity and similar hydrophobicity to PP were well dispersed in the PP matrix.
Description: Closed access.
Sponsor: The authors gratefully acknowledge the financial support of the UK Department of Trade and Industry/Technology Strategy Board.
Version: Published
DOI: 10.1016/j.jcis.2009.02.014
URI: https://dspace.lboro.ac.uk/2134/22420
Publisher Link: http://dx.doi.org/10.1016/j.jcis.2009.02.014
ISSN: 0021-9797
Appears in Collections:Closed Access (Materials)

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