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Atomistic modelling of ploughing friction in silver, iron and silicon

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posted on 2006-10-16, 10:36 authored by Devianee Mulliah, Steven KennySteven Kenny, Edward McGee, Roger Smith, A. Richter, B. Wolf
Molecular dynamics (MD) simulations of atomic-scale stick-slip have been per- formed for a diamond tip in contact with the (100) surface of fcc Ag, bcc Fe, Si and H-terminated Si, at a temperature of 300 K. Simulations were carried out at different support displacements between 5 and 15 °A. The simulations illustrate the important mechanisms that take place during stick-slip. In particular, for the case of the metals they show a direct link between tip slip events and the emission of dislocations from the point of contact of the tip with the substrate. This occurs both during indentation and scratching. For the case of silicon, no slip events were observed and no sub-surface dislocations were generated underneath the scratch groove. At the deeper support displacement of 15 °A the silicon atoms undergo some local phase transformations and the atom co-ordination number varies between 5 and 8, with the majority being 5-fold or 6-fold coordinated. Both the dynamic and the static friction coefficients were found to be higher for Si compared to the cor- responding values for H-terminated Si. Comparisons were made between the MD simulations and experimental measurements for indentation on the (100) surface of Si and Al. A good qualitative agreement was observed between the experimental and theoretical results. However in both the cases of Si and metals the MD simulations give a contact pressure under load that is depth dependent and values that are higher than experimental nanohardness values.

History

School

  • Science

Department

  • Mathematical Sciences

Pages

9232965 bytes

Citation

MULLIAH, D. ... et al, 2006. Atomistic modelling of ploughing friction in silver, iron and silicon. Nanotechnology 17 (8), pp. 1807-1818

Publisher

© Institute of Physics

Publication date

2006

Notes

This article was published in the journal Nanotechnology [© Institute of Physics] and is also available at: http://www.iop.org/EJ/journal/0957-4484

ISSN

0957-4484

Language

  • en

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