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Please use this identifier to cite or link to this item: https://dspace.lboro.ac.uk/2134/25762

Title: Removal of submicron particles from solid surfaces using surfactants
Authors: Mahdi, Faiz M.
Record, T.E.
Amadi, C.A.
Emmanuel, F.O.
Ivanova, Natalia A.
Trybala, Anna
Starov, Victor
Keywords: Surfaces cleaning
Nanoparticles
Surfactants
Hydrophilic and hydrophobic particles and surfaces
Issue Date: 2015
Publisher: © Elsevier
Citation: MAHDI, F.M. ...et al., 2015. Removal of submicron particles from solid surfaces using surfactants. Colloids and Interface Science Communications, 6, pp. 13-16.
Abstract: The removal of nano- or submicron particles from solid substrates is of considerable interest in a range of existing industries including cleaning of surfaces inside a spacecraft after evaporation of nanofluids. A method of nanoparticle removal using aqueous surfactant solutions is proposed. The surfactants' cleaning efficiency is investigated for all four combinations of hydrophilic (HL) and hydrophobic (HB) nanoparticles and surfaces, in order to find the most successful cleaning method in each combination. Carbon and silica nanoparticles deposited onto Teflon and glass surfaces were used. Cationic, anionic and non-ionic surfactants with a range of CMCs and HLBs were used in order to identify the best surfactant in each scenario.
Description: This is an Open Access Article. It is published by Elsevier under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International Licence (CC BY-NC-ND). Full details of this licence are available at: http://creativecommons.org/licenses/by-nc-nd/4.0/
Sponsor: This work was supported by the Royal Society (Grant no. 2014 Russia (RFBR) Costshare), UK and the Russian Foundation for Basic Research (Grant no. 14-01-92602 KO_a); MAP EVAPORATION project, European Space Agency; Marie Curie CoWet project, EU; Procter & Gamble, USA and COST-MP1106, EU.
Version: Published
DOI: 10.1016/j.colcom.2015.10.001
URI: https://dspace.lboro.ac.uk/2134/25762
Publisher Link: http://dx.doi.org/10.1016/j.colcom.2015.10.001
Appears in Collections:Published Articles (Chemical Engineering)

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