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On the assessment by grazing-incidence small-angle X-ray scattering of replica quality in polymer gratings fabricated by nanoimprint lithography

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posted on 2017-09-27, 11:00 authored by M. Soccio, N. Alayo, Ignacio Martin-Fabiani, Daniel R. Rueda, Mari-Cruz Garcia-Gutierrez, Esther Rebollar, D.E. Martinez-Tong, F. Perez-Murano, Tiberio A. Ezquerra
Grazing-incidence small-angle X-ray scattering (GISAXS) can be used to characterize the replica quality of polymer gratings prepared by thermal nanoimprint lithography (NIL). Here it is shown using GISAXS experiments that a series of NIL polymer gratings with different line quality present characteristic features that can be associated with the level of defects per line. Both stamps and NIL polymer gratings exhibit characteristic semicircle-like GISAXS patterns. However NIL polymer gratings with defective lines exhibit GISAXS patterns with an excess of diffuse scattering as compared to those of the corresponding stamps. In a first approach, this effect is attributed to a reduction of the effective length of the lines diffracting coherently as the number of defects per line increases.

Funding

The financial support of MICINN through CTQ2010-15680 MAT2011-23455 and MAT2012-33517 is gratefully acknowledged. E.R. and I. M-F. thank MICINN, Spain, for a “Ramón y Cajal ” contract (RYC-2011-08069) and for a FPI fellowship respectively. M.S. and D.-T thank CSIC for the tenure of JAE fellowships and the Fondo Social Europeo (FSE) for co-financing the JAE program. We are indebted to J. Perlich for outstanding beamline support.

History

School

  • Aeronautical, Automotive, Chemical and Materials Engineering

Department

  • Materials

Published in

Journal of Applied Crystallography

Volume

47

Issue

2

Pages

613 - 618

Citation

SOCCIO, M. ... et al., 2014. On the assessment by grazing-incidence small-angle X-ray scattering of replica quality in polymer gratings fabricated by nanoimprint lithography. Journal of Applied Crystallography, 47 (2), pp. 613 - 618.

Publisher

© International Union of Crystallography

Version

  • AM (Accepted Manuscript)

Publisher statement

This work is made available according to the conditions of the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International (CC BY-NC-ND 4.0) licence. Full details of this licence are available at: https://creativecommons.org/licenses/by-nc-nd/4.0/

Publication date

2014

Notes

This article was published in the Journal of Applied Crystallography [© International Union of Crystallography] and the definitive version is available at: https://doi.org/10.1107/S160057671400168X

ISSN

0021-8898

eISSN

1600-5767

Language

  • en

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