A technique is described for depositing thin films (≈ 200nm)
of visibly transparent, electrically conducting metal- and
metal alloy-oxides onto room temperature substrates of
either glass or plastic by the technique of high rate
reactive magnetron sputtering. [Continues.]
A Doctoral Thesis. Submitted in partial fulfilment of the requirements for the award of Doctor of Philosophy at Loughborough University.
EEC. SERC. Camvac. Van Leer Research