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Determination of mode I and II adhesion toughness of monolayer thin films by circular blister tests

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journal contribution
posted on 2018-01-11, 11:22 authored by Christopher HarveyChristopher Harvey, Simon WangSimon Wang, Bo Yuan, Rachel ThomsonRachel Thomson, Gary Critchlow
Mechanical models are developed to determine the mode I and II adhesion toughness of monolayer thin films using circular blister tests under either pressure load or point load. The interface fracture of monolayer thin film blisters is mode I dominant for linear bending with small deflection while it is mode II dominant for membrane stretching with large deflection. By taking the advantage of the large mode mixity difference between these two limiting cases, the mode I and II adhesion toughness are determined in conjunction with a linear failure criterion. Thin films under membrane stretching have larger adhesion toughness than thicker films under bending. Experimental results demonstrate the validity of the method.

History

School

  • Aeronautical, Automotive, Chemical and Materials Engineering

Department

  • Materials

Published in

Theoretical and Applied Fracture Mechanics

Citation

HARVEY, C.M., 2018. Determination of mode I and II adhesion toughness of monolayer thin films by circular blister tests. Theoretical and Applied Fracture Mechanics, 94, pp. 34-39.

Publisher

© Elsevier

Version

  • AM (Accepted Manuscript)

Publisher statement

This work is made available according to the conditions of the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International (CC BY-NC-ND 4.0) licence. Full details of this licence are available at: https://creativecommons.org/licenses/by-nc-nd/4.0/

Acceptance date

2018-01-05

Publication date

2018-01-06

Notes

This paper was published in the journal Theoretical and Applied Fracture Mechanics and the definitive published version is available at https://doi.org/10.1016/j.tafmec.2018.01.006.

ISSN

0167-8442

Language

  • en