Loughborough University
Leicestershire, UK
LE11 3TU
+44 (0)1509 263171
Loughborough University

Loughborough University Institutional Repository

Please use this identifier to cite or link to this item: https://dspace.lboro.ac.uk/2134/3226

Title: Influence of operating frequency and coupling coefficient on the efficiency of microfabricated inductively coupled plasma sources
Authors: Iza, Felipe
Hopwood, Jeffrey A.
Issue Date: 2002
Publisher: © Institute of Physics Publishing
Citation: IZA, F. and HOPWOOD, J.A., 2002. Influence of operating frequency and coupling coefficient on the efficiency of microfabricated inductively coupled plasma sources. Plasma Sources Science and Technology, 11, pp. 229–235.
Abstract: Microfabricated inductively coupled plasma (mICP) generators, operating at 690 and 818 MHz, have been constructed and characterized. The mICP consists of a single-turn coil that is 5mm in diameter and a microfabricated matching network. Ion densities of ~9 × 10(10) cm−3 in argon at 400mTorr consuming only 1W were obtained. This ion density is three times larger than previous mICP sources under the same conditions. The influence of the frequency of operation and the coupling coefficient on the power efficiency has also been studied. Contrary to what was observed in former generations of mICP sources operating at lower frequencies, the efficiency of the new mICP sources decreases as the frequency increases. A model that incorporates the electron inertia, the power dependence of the plasma resistance and the frequency dependence of the coil resistance agrees with the new experimental results as well as with the results of previous mICP sources. It was also observed that bringing the coil closer to the plasma increases the coupling coefficient of the ICP sources and thereby improves the efficiency of the device. The improvement in efficiency, however, is limited by the non-scalable plasma sheath width near the coil.
Description: This article is Closed Access. It was published in the journal, Plasma Sources Science and Technology [© Institute of Physics Publishing] and is available at: http://www.iop.org/EJ/journal/PSST
URI: https://dspace.lboro.ac.uk/2134/3226
ISSN: 0963-0252
Appears in Collections:Closed Access (Electronic, Electrical and Systems Engineering)

Files associated with this item:

File Description SizeFormat
PSST_11_Restrict.pdf296.73 kBAdobe PDFView/Open

 

SFX Query

Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.