lithography_revision_final.pdf (4.3 MB)
Use of supramolecular assemblies as lithographic resists
journal contribution
posted on 2019-03-28, 15:09 authored by Scott M. Lewis, Antonio Fernandez-Mato, Guy A. DeRose, Matthew S. Hunt, George F. Whitehead, Agnese Lagzda, Hayden R. Alty, Jesus Ferrando-Soria, Sarah Varey, Andreas K. Kostopoulos, Fredrik Schedin, Christopher A. Muryn, Grigore A. Timco, Axel Scherer, Stephen G. Yeates, Richard E. WinpennyA new resist material for electron beam lithography has been created that is based on a supramolecular assembly. Initial studies revealed that with this supramolecular approach, high‐resolution structures can be written that show unprecedented selectivity when exposed to etching conditions involving plasmas.
Funding
Engineering and Physical Sciences Research Council. Grant Number: EP/L018470/1 and Kavli Nanoscience Institute
History
School
- Science
Department
- Chemistry
Published in
Angewandte Chemie International EditionVolume
56Issue
24Pages
6749 - 6752Citation
LEWIS, S.M. ... et al, 2017. Use of supramolecular assemblies as lithographic resists. Angewandte Chemie International Edition, 56 (24), pp.6749-6752.Publisher
© WileyVersion
- AM (Accepted Manuscript)
Publisher statement
This work is made available according to the conditions of the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International (CC BY-NC-ND 4.0) licence. Full details of this licence are available at: https://creativecommons.org/licenses/by-nc-nd/4.0/Publication date
2017-05-15Notes
This is the peer reviewed version of the following article: LEWIS, S.M. ... et al, 2017. Use of supramolecular assemblies as lithographic resists. Angewandte Chemie International Edition, 56 (24), pp.6749-6752, which has been published in final form at https://doi.org/10.1002/anie.201700224. This article may be used for non-commercial purposes in accordance with Wiley Terms and Conditions for Use of Self-Archived Versions.ISSN
1433-7851eISSN
1521-3773Publisher version
Language
- en
