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Title: Frequency range of stable dielectric-barrier discharges in atmospheric He and N2
Authors: Deng, X.T.
Kong, Michael G.
Keywords: Atmospheric pressure nonthermal plasmas
Frequency mechanisms
Gas discharge
Plasma modeling
Stability
Issue Date: 2004
Publisher: © IEEE
Citation: DENG, X.T. and KONG, M.G., 2004. Frequency range of stable dielectric-carrier discharges in atmospheric He and N2. IEEE Transactions on Plasma Science, 32(4), pt.3, pp.1709-1715.
Abstract: While there have been extensive studies of nonthermal atmospheric dielectric-barrier discharges (DBD), many key facets of their characteristics remain to be unraveled before their full understanding is achieved. One of the missing pieces in our current knowledge is the dependence of stable DBD production upon temporal characteristics of the applied voltage such as excitation frequency. In this contribution, we report a numerical investigation of the frequency range for the generation of stable DBD and that of likely mechanisms for disruption of DBD stability.We show that when the excitation frequency is too low, an irreversibly large mismatch of the rise-time occurs between the applied voltage and the memory voltage. It is demonstrated that this mismatch results in a rapid suppression of the gas voltage and as such, the generated DBD is quenched prematurely. Also, it is shown that when the excitation frequency is too high, most electrons produced in the plasma bulk become trapped in the interelectrode gap and are unable to reach the electrodes. As a result, the gas voltage increases without being contained adequately by a sizeable memory voltage. Again, this leads to premature plasma quenching. These observations highlight the importance of the dynamic balance between the applied voltage and the memory voltage in dielectric-barrier discharges. We compare the above issues in both a helium DBD and a nitrogen DBD and report that our findings of the two stability disruption mechanisms are generic in different DBD systems.
Description: This article was published in the journal, IEEE Transactions on Plasma Science [© 2004 IEEE] and is also available at: http://ieeexplore.ieee.org/ Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.
Version: Published
DOI: 10.1109/TPS.2004.831599
URI: https://dspace.lboro.ac.uk/2134/5223
ISSN: 0093-3813
Appears in Collections:Published Articles (Electronic, Electrical and Systems Engineering)

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