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Title: From submicrosecond-to nanosecond-pulsed atmospheric-pressure plasmas
Authors: Iza, Felipe
Walsh, James L.
Kong, Michael G.
Keywords: Atmospheric pressure
Nanosecond
Pulsed plasma
Simulation
Issue Date: 2009
Publisher: © IEEE
Citation: IZA, F., WALSH, J.L. and KONG, M.G., 2009. From submicrosecond-to nanosecond-pulsed atmospheric-pressure plasmas. IEEE Transactions on Plasma Science, 37 (7), pt.2., pp.1289-1296.
Abstract: We have developed a time-hybrid computational model to study pulsed atmospheric-pressure discharges and compared simulation results with experimental data. Experimental and computational results indicate that increasing the applied voltage results in faster ignition of the discharge and an increase in the mean electron energy, opening the door to tunable plasma chemistry by means of pulse shaping. Above a critical electric field of ~2 kV/mmfor ~1-mm discharges, pulsed plasmas ignite right after the application of an externally applied voltage pulse. Despite the large pd value (30–300 torr · cm) and the high applied electric field, the discharges are found to be streamer free in a desirable glowlike mode. The comparison of the time evolution of the mean electron kinetic energy as a function of the pulse rise time suggests that a fast rise time is not necessarily the best way of achieving high mean electron energy.
Description: This article was published in the journal IEEE Transactions on Plasma Science [© IEEE 2009]. It is also available from: http://ieeexplore.ieee.org/servlet/opac?punumber=27. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.
Version: Published
DOI: 10.1109/TPS.2009.2014766
URI: https://dspace.lboro.ac.uk/2134/5242
ISSN: 0093-3813
Appears in Collections:Published Articles (Electronic, Electrical and Systems Engineering)

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