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Title: Electronic quenching of OH(A) by water in atmospheric pressure plasmas and its influence on the gas temperature determination by OH(A–X) emission
Authors: Bruggeman, Peter
Iza, Felipe
Guns, Peter
Lauwers, Daniel
Kong, Michael G.
Gonzalvo, Yolanda Aranda
Leys, Christophe
Schram, Daan C.
Issue Date: 2010
Publisher: © Institute of Physics Publishing
Citation: BRUGGEMAN, P....et al., 2010. Electronic quenching of OH(A) by water in atmospheric pressure plasmas and its influence on the gas temperature determination by OH(A–X) emission. Plasma Sources Science Technology, 19(015016), 7pp.
Abstract: In this paper it is shown that electronic quenching of OH(A) by water prevents thermalization of the rotational population distribution of OH(A). This means that the observed ro-vibrational OH(A–X) emission band is (at least partially) an image of the formation process and is determined not only by the gas temperature. The formation of negative ions and clusters for larger water concentrations can contribute to the non-equilibrium. The above is demonstrated in RF excited atmospheric pressure glow discharges in He–water mixtures in a parallel metal plate reactor by optical emission spectroscopy. For this particular case a significant overpopulation of high rotational states appears around 1000 ppm H2O in He. The smallest temperature parameter of a non-Boltzmann (two-temperature) distribution fitted to the experimental spectrum of OH(A–X) gives a good representation of the gas temperature. Only the rotational states with the smallest rotational numbers (J 7) are thermalized and representative for the gas temperature.
Description: This article is Restricted Access. It was published in the journal, Plasma Sources Science and Technology [© Institute of Physics]. The definitive version is available at: http://iopscience.iop.org/0963-0252/19/1/015016/
Version: Closed access
DOI: 10.1088/0963-0252/19/1/015016
URI: https://dspace.lboro.ac.uk/2134/6390
ISSN: 0963-0252
Appears in Collections:Closed Access (Electronic, Electrical and Systems Engineering)

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